Vistec signed a Strategic Cooperation Partnership Agreement with the National Centre of Nanoscience and Technology in Beijing
Vistec Lithography, B.V. has announced today that it recently stepped into a strategic cooperation partnership with the National Centre of Nanoscience and Technology in Beijing, Peoples Republic (PR) of China.
The National Centre of Nanoscience and Technology (NCNST) – the leading centre for basic and applied research in nanoscience in China - and Vistec Lithography - a leading supplier of electron-beam lithography systems will collaborate in nanolithography research and education.
The NCNST has established itself as a public technology platform and research base for nanoscience and technology. With its enormous research capabilities and state–of–the–art equipment, the NCNST is open to Chinese and international users. Following this strategy consequently, the Vistec EBPG5000pES electron-beam lithography system was chosen by the NCNST to achieve their ambitious objectives and to support existing and future partners as much as possible. "The strategic partnership with Vistec is very important for the NCNST and its challenging scientific targets", stated Prof. Chen Wang, Director NCNST.
The Vistec EBPG5000pES is a high-performance lithography tool based on reliable and well-proven system architecture. With its electron-optical column (TFE source) rated for acceleration voltages of 50 and 100kV, the system provides a spot size down to < 2.2nm, thus allowing nano-lithography structures smaller than 8nm to be routinely generated. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments. Thanks to these features, its high degree of flexibility and user friendliness, the EBPG Series is appreciated worldwide in leading Universities and research centres with more than 80 globally installed systems.
"Vistec is very proud to be associated with the renowned NCNST. In this context, it is worth to mention that we are deeply impressed by the widespread network of the NCNST", said Erwin Mueller, Managing Director of Vistec Lithography, B.V. "We are convinced both sides will benefit from our strategic cooperation partnership."
Media information:
National Centre of Nanoscience and Technology The National Centre for Nanoscience and Technology (NCNST) of China is co-founded by Chinese Academy of Sciences (CAS) and Ministry of Education.
It is a subsidiary non-profit organization of CAS which enjoys full financial allocations with a status of independent non-profit legal entity.
It will have 155 formal employees. The centre was officially founded on December 31, 2003, with CAS, Peking University and Tsinghua University as its initiators and co-founders.
The NCNST adopts a system that its director takes full responsibilities under leadership of a governing board. The centre established an academic committee which aids the governing board to determine important research areas and moving directions of NCNST.
In NCNST, basic and applied researches in nanoscience have been positioned as the main research directions. Its objective is to build a public technological platform and research base for nanoscience, which is featured with state- of- the- art equipments and is open to both domestic and international users.
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Vistec Lithography
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced research laboratories and universities.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron-beam systems are used for microchip production and integrated optics as well as for scientific and commercial research.
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Vistec Lithography, Inc.
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Watervliet, NY 12189 (USA)
Ines Stolberg
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Tel.: +49(0)3641/651955
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